The basis of laser cleaning is the use of high energy laser beams. The laser generates a focused beam of light that is directed at the surface to be cleaned. Upon contact with the surface, the energy of the laser beam is transferred to the contaminants.

The laser energy causes different cleaning mechanisms, depending on the type of contamination and the surface to be cleaned. A frequently used principle is the so-called "ablative-thermal" cleaning. In this process, the contamination evaporates directly due to the high energy of the laser beam. This occurs without damaging the underlying surface.

Another principle is "photochemical" cleaning. Here, the laser beam stimulates the contaminant to undergo chemical reactions that lead to its decomposition. This enables gentle and effective cleaning, especially for sensitive materials.

Our FEMTA systems offer an impressive pulse energy of over 5 mJ and enable effective cleaning of a wide range of materials. By using single-mode fibers, our systems achieve outstanding cleaning precision and quality compared to multimode fiber lasers. In addition, the short spectral width at FWHM, the short pulse length and the narrow focused beam size ensure that the base material is only minimally heated.

If higher power or specific cleaning precision is required, we offer customized solutions. Based on a thorough analysis of customer samples in the lab, including radiation/absorption spectrum, pulse duration, energy, intensity, overlap, repetition rate and other parameters, we develop the optimal solution. This may include manufacturing higher-power multimode fiber lasers, installing laser sources with different wavelengths, or adjusting the pulse duration and other parameters of our standard laser units.